Injoo Kim, Myoungok Kim og Zachary Hoh Apparel Design through Patternmaking

Produktbeskrivelse

Apparel Design Through Patternmaking is a fresh design-oriented flat patternmaking text that gives fashion students a new perspective on patternmaking knowledge and skills they need to develop contemporary women’s, men’s, and children’s wear. This book covers a comprehensive range of concepts in flat pattern drafting, such as fit, style, and design development, and the modular approach allows for flexible design options across age, gender, and size, as reflected in current fashion trends. 200 detailed principles address proper measurements; body shapes; dart manipulation; neckline, collar, and sleeve variations; fit issues and corrections; garment details; and more, all of which are easily visualized with hundreds of line drawings and photos. Reference size charts and a decimal conversion chart included in the Appendix make this text user-friendly for international students. Key Features: - 20 slopers, 30 foundations, and variations - 220 detailed principles of patternmaking - 100+ applied garment designs - A chapter on Cut & Sew stretch fabrics - Learning objectives with clear flat sketches in each chapter - A decimal conversion chart, reference size charts, and glossary of key terms STUDIO Features Include: - Watch videos that show the development process for customized sloper sets - Review concepts with flashcards of essential vocabulary - Practice with additional 1/2 scale slopers Instructor Resources Include: - Instructor's Guide provides suggestions for planning the course and using the text in the classroom, supplemental assignments, and lecture notes...

Produktspecifikationer